Magnetron Sputtering of Silicon Dioxide

Silicon dioxide (SiO2) is an important material for manufacturing of semiconductors and microelectromechanical systems (MEMS). It is mainly used for passivation or insulation films and as dielectric layer.

Read more

One application example is the deposition of SiO2 as temperature compensation layer for TC-SAW filter devices in mobile communication. The performance of those filters strongly depends on the quality of the deposited SiO2 layer. Therefore, a cost-effective solution for high volume production with reliable process results and high wafer throughput is needed.

Acetron supply professional and honest service.

Advantages of magnetron sputtering for silicon dioxide deposition

• Dense films with high homogeneity and good purity
• Excellent coating precision
• Deposition with high rates
• Low substrate temperature allows processing of materials that are very fragile and sensitive to high temperatures and rapid temperature changes
• Variation of film properties by adjustable energetic substrate bombardment

SiO2 thin films were prepared with radio frequency magnetron sputtering on quartz glass substrates, and the effects of sputtering power on the stoichiometric ratio, microstructure, surface morphology and optical properties of the film within 300&#; nm were investigated. The molar ratio of O/Si in the film increased continuously from 1.87 to 1.99, very close to the ideal stoichiometric ratio of 2:1 with the sputtering power decreasing from 150 to 60 W. And the surface of SiO2 thin film became more compact and flatter, and the roughness was significantly reduced. All the SiO2 films were amorphous, and the power had no obvious effect on the crystalline state of the film. When the sputtering power decreased from 150 to 60 W, the refractive index and absorptivity of SiO2 film in the range of 300&#; nm decreased continuously, while the transmittance within 300&#; nm of the coated quartz glass (hereinafter referred to as the transmittance of film) increased continuously, and the integrated transmittance increased from 92.7 to 93.0%.

Want more information on sio2 sputtering? Feel free to contact us.